• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a device (100, 200) for coating preparations comprising: a vacuum chamber (105, 205) in the form of a metallic recipient, at least one source of coating material assigned to the vacuum chamber (105, 205), at least one sample holder (120) by means of which at least one sample to be prepared can be positioned within the vacuum chamber (105, 205) in a sample position, - control electronics, - an operator console (103, 203) for inputting commands for the control electronics, and - a housing (101, 201), which at least the vacuum chamber (105, 205) and the control electronics surround, the housing (101, 201) having a width (b, b ") substantially equal to the width (b ') of the vacuum chamber (105, 205), the vacuum chamber (105, 205) comprises a door (106, 206) located at a front of the chamber, the control panel (103, 203) being located in or in front of a foot region (102, 205) located below the vacuum chamber (105, 205) , 202) of the housing (101, 201), and the source is mountable on the top of the vacuum chamber (105, 205).
    公开号:AT512950A1
    申请号:T50220/2012
    申请日:2012-06-04
    公开日:2013-12-15
    发明作者:Paul Wurzinger；Anton Lang
    申请人:Leica Microsysteme Gmbh；
    IPC主号:
    专利说明:

    P12610
    DEVICE FOR PREPARING, ESPECIALLY COATING, SAMPLES
    The invention relates to a device for coating preparations, e.g. for the following electron microscopic examination, comprising: a vacuum chamber in the form of a metallic recipient, at least one source of coating material assigned to the vacuum chamber, at least one sample holder, by means of which at least one sample to be prepared can be positioned within the vacuum chamber in a sample position, one Control electronics, - a control panel for inputting commands for the control electronics, and - a housing which surrounds at least the vacuum chamber and the control electronics
    Preparation devices of the type mentioned are known in various designs and are used for coating samples and substrates under high and fine vacuum atmosphere, including for coating electron microscopic preparations with thin conductive material layers. In sputtering, also known as sputtering, sputter coating " or "sputter coating" is known, are precipitated by high-energy ions, usually an activated noble gas plasma or a noble gas ion beam, from a target such as platinum or gold metal atoms, which then precipitate on the sample and form a layer there. Also well known are vacuum evaporation devices by means of which evaporation material is vaporized by thermal heating with electric current. The known methods of carbon filament evaporation, carbon rod evaporation, metal evaporation from a boat or helix and electron beam evaporation are widely used in electron microscopy, particularly in the production of impression and amplification films for transmission electron microscopy and very thin conducting surface layers for scanning electron microscopic samples , In addition, numerous devices are in use, which allow a combination of several different Probenpräparatianstechiken. For cryo-scanning electron microscopy (Cryo-SEM) or transmission electron microscopy (TEM), samples are prepared in freeze-breakage and freeze-etching equipment under high vacuum, whereby in the vacuum chamber this -2-PI 2610
    Plants are arranged in addition to the components provided for the coating and the necessary for the freeze fracture or the freeze-etching processing tools.
    Known devices for the preparation of electron microscopic specimens are produced, for example, by the companies Cressington, Quorum Technologies, Denton Vacuum and Gatan. The known devices, in their most common embodiment, essentially consist of a removable glass cylinder in which the specimen is mounted on a specimen holder, e.g. in the form of a sample table, a lid for the glass cylinder containing the source of the coating material and a base with the electronic control, the vacuum pumps and the receptacle for the glass cylinder. In some devices, the vacuum chamber is a metal recipient. Larger systems also have a front door.
    The known devices have the following disadvantages:
    The devices are usually very wide and take up a large footprint in the laboratory. The usually scarce laboratory space can therefore not be used efficiently. - The removable glass cylinder can easily be damaged at the sealing surfaces by chipping, resulting in problems with the vacuum density.
    The lid with the source of the coating material, which is stored mostly tiltable, is often problematic in terms of vacuum tightness. - To remove the samples, the coating source picked up in the lid must be moved when the lid is opened. In this case, residues of an incompletely evaporated material (for example carbon filament) or layer particles which dissolve from the environment of the source may fall onto the sample. - Due to the risk of implosion, a splinter protection around the glass cylinder is required for safety. - For the connection of vacuum transfer devices for samples (for example for cryo-fixed samples to be prepared for subsequent examination in the cryo-electron microscope), the glass cylinder must be replaced by a metal cylinder with side flanges. Apart from the complicated handling, this requires even more laboratory space. -3- PI261Ο
    An ergonomic operation for the operator is particularly important for devices with
    Glass cylinder (operation from above) difficult
    It is therefore an object of the invention to overcome the above drawbacks and to provide a device which has the advantages of a small footprint in the laboratory, an ergonomic operation, and an improved modular design and in which the problems encountered in the known devices in terms of Vacuum tightness and the sample contamination are bypassed.
    The object is achieved by a device for coating preparations, e.g. for the subsequent electron microscopic examination of the type mentioned above achieved in that according to the invention, the housing has a width substantially equal to the width of the vacuum chamber, wherein the vacuum chamber has a door located at a front of the chamber, the control panel in or in front of below the vacuum chamber disposed foot portion of the housing is located, and the at least one source is mounted on the top of the vacuum chamber
    Thanks to this solution, the task can be solved in a particularly efficient manner. Due to the small width of the device, which is essentially given by the width of the vacuum chamber, the greatest possible use of the laboratory space surface is made possible. Since the vacuum chamber is made of metal, e.g. Stainless steel or aluminum, with a door located at the front, fall the glass splitter in the event of an implosion in the chamber, whereby the device safety is not critical compared to the above-mentioned known devices with glass cylinder The inventive device also has significant advantages for an operator because of the arrangement of the door at the front ergonomically favorable access to the samples results; in particular, the samples can be taken without having to move the sources beforehand. Likewise, the arrangement of the control console is ergonomically favorable in or in front of a foot region of the housing arranged below the vacuum chamber.
    Under the term "front " is the user facing side of the device (the device) to understand. The term "longitudinal direction" is the horizontal direction that is perpendicular to the front "depth " is the (maximum) extent along the -4- P12610 longitudinal direction. The term "width " refers to the (maximum) extent in the horizontal direction perpendicular to the longitudinal direction.
    According to the invention, the housing has a width which essentially corresponds to the width of the vacuum chamber. The term "essentially " means that the housing of the device is no more than the necessary mounting distance, which takes into account manufacturing tolerances, from the outer edge of the metallic vacuum chamber (metal recipient) The outer width of the metal recipient is the necessary wall thicknesses as well as the space for mounting of mounting and locking means increased for the front door and any sensors compared to the interior.
    A variety of coating material sources and corresponding methods for applying a material layer are available to a person skilled in the art. The source may in one aspect be an evaporation source with a filamentous or rod-shaped evaporation material accommodated in the evaporation source, which is evaporated as described above by heating with electric current. The thread-like or rod-shaped evaporation material is, for example, a carbon thread or carbon rod. Further, the source may be for the known sputtering method (referred to as "sputtering", "sputter coating" or "sputter coating") in which, as described above, by means of high-energy ions, typically a noble gas plasma or a noble gas ion beam, metal atoms (gold , Platinum, etc.) are knocked out of a target, which then settle on the sample and form a layer there. Further, the source may be configured for electron beam evaporation ("electron beam evaporation") of a coating material. In one aspect, the device may be equipped with a glow discharge device for surface treatment and cleaning of the sample surfaces to be coated.
    The device may include one or more sources. Typically, the device includes up to two of the above sources. Due to the small width of the device according to the invention, a plurality of devices can be arranged side by side in a space-saving manner in the event of a need for further coating methods.
    The at least one sample is received in a sample holder. A person skilled in the art will be aware of a well-known variety of the commonly available prior art.
    Fl 2610
    Sample holders available. The at least one sample holder can be realized, for example, as a sample table, wherein a great variety is also available to the person skilled in the art with regard to the design of the sample table, for example tiltable and rotatable sample tables, pin sample tables or planetary movement rotary tables. In order to achieve the highest possible modularity, the sample table can be exchangeable.
    It is advantageous if the walls of the recipient are protected from being coated with removable sheets or other screen devices. These sheets can be cleaned easily when removed. As a result, a tedious cleaning of the recipient is no longer necessary. In addition, different sets of mudguards can be used for different coating methods. Thereby influencing one coating by the other, e.g. by secondary sputtering from the walls, minimized
    In one aspect, the apparatus may be used to prepare samples in a fine vacuum (up to 10 μMbar), and in another aspect to prepare samples in a high vacuum (to 10 -7 mbar, in some cases to 10 -8 mbar) ,
    The term "sample" refers to preparations for scientific experiments or examinations, e.g. Examination in the electron microscope. For these examinations, the samples are in most cases on an electron microscope sample carrier, the term 11 Pr top carrier " refers to all suitable for electron microscopy and for the electron microscopic sample preparation carrier. Examples of this are the well-known grids used in a TEM, but also in a REM (" reticle ", " nets ", " netting "), variously shaped holes (honeycombs, slits, etc.) or a grid have defined mesh number. For REM, further e.g. Silicon wafers, graphite wafers, and conductive double-stick tapes ("conductive tabs").
    According to one aspect of the invention, the front side of the vacuum chamber is a flat surface with an opening formed therein, and the door is formed by a plate held on the outside of the opening, with which the opening can be closed in a vacuum-tight manner. This allows a particularly good seal and problems with the gasket -6- P12610 are avoided. In a sub-aspect, the vacuum chamber has a cuboidal basic shape, with one side of the cuboid forming the front side.
    The door preferably has a viewing window in order to be able to monitor the processes taking place in the vacuum chamber. For the preparation of electron microscopic samples and the subsequent transfer of the sample from the device in an electron microscope, it is expedient if the device for the preparation of samples for a subsequent examination in an electron microscope is designed and on the sample holder at least one sample in a on the As a result, the sample holder together with the at least one sample accommodated therein can be detached from the sample table and transferred into an electron microscope for a subsequent electron microscopic examination. The electron microscope has for this purpose a corresponding holder for the sample holder.
    In order to change and / or clean the sources, it is expedient for each of the at least one source to be accommodated in a detachable bushing and to be fastened to the top of the vacuum chamber with the latter.
    For safety reasons, it is favorable if a protective cover is arranged above the at least one source, which has a switching element which triggers when the protective cover is opened and which is connected to an interruption for the power supply of the at least one source. The protective cover is realized with advantage as arranged over the exchangeable sources flap, which is equipped with a safety switch. After opening the protective cover, the sources for changing and / or cleaning are easy and safe removable.
    In order to enable a particularly small width and therefore optimum utilization of the laboratory work surface, it is advantageous if the housing of the vacuum chamber at its maximum lateral extent bears laterally, and it may be advantageous if it is not more than the necessary for safe mounting tolerance distance having
    The control panel is preferably realized as a touchscreen according to known manner. In one aspect, the control electronics are located below and / or behind the vacuum chamber. Preferably, however, the control electronics is arranged below the vacuum chamber, since the resulting increased vacuum chamber results in improved ergonomics for the operator.
    In many applications and preparation methods it is desired to connect extensions to the vacuum chamber. In a further aspect, the device therefore has flanges located laterally on the vacuum chamber, to which extensions made through the housing, in particular a transfer device, a lock or a cooling device with a reservoir for a cryogen, can be connected. Due to the small width and the associated narrow design of the device, it is therefore possible to connect extensions on the left or right side flanges, without excessive laboratory floor space is claimed. For example, cryofixed samples, which are cooled very rapidly to avoid ice crystal formation, must be transferred to the device according to the invention for further sample preparation in the cooled state. This transfer of the cryofixed sample is very critical because the sample immediately coats with ice crystals on contact with moist air. The transfer is therefore preferably carried out by means of a special (vacuum transfer device, for example a Leica EM VCT 100 vacuum cryotransfusion device.) Via a lock it is also possible to introduce non-cooled sample holders with samples received therein into the vacuum chamber of the device such as, for example, connecting a container with liquid nitrogen to cool the samples in the vacuum chamber via cooling belts and / or to improve the vacuum due to the cold surfaces of the container, which act similarly to a kyopump.
    In a particularly space-saving variant, the vacuum chamber has connections to the vacuum supply, which connections are arranged exclusively on the back of the vacuum chamber.
    In one development of the invention, provision is made for a device for cryo-sample preparation, in particular freeze-fracture, freeze-etching, freeze-drying and impression technique, to be arranged within the vacuum chamber. This training allows the
    -8- PI2610
    Sample preparation using cryo-sample preparation in combination with one or more coating techniques (e.g., metal and / or carbon coating) under high vacuum of IO7 mbar or more in a single device. Accordingly, in the vacuum chamber, the necessary and sufficient for the cryopreparation processing tools, e.g. a cold knife, arranged The located at the front of the vacuum chamber door, which expediently has a viewing window, allows an ergonomic attitude of the operator during the manipulation of the sample. For many electron microscopic applications, it is very important that the material layer deposited on the sample has a certain thickness, which should not exceed or fall below a certain tolerance range. For this reason, it is advantageous if a quartz crystal for measuring the deposited coating material layer thickness is arranged in the vacuum chamber. Such quartz crystals are well known to a person skilled in the art and are typically arranged in the immediate vicinity of the sample
    The invention together with further details and advantages will be explained in more detail below with reference to two exemplary embodiments, namely a device for sample preparation in a fine vacuum and a device for sample preparation in a high vacuum, which are shown in the accompanying drawings. The drawings show in detail in schematic form;
    1 is a perspective view of a first embodiment of a device according to the invention for sample preparation in a fine vacuum viewed from top left,
    2 is a perspective view of the device of FIG. 1 viewed from the top right,
    3 is a side view of the device of Fig. 1,
    4 is a rear view of the device of Fig. 1,
    5 is a perspective view of the vacuum chamber of the device of Figure 1 with the door open and without housing, control electronics and control panel.
    Fig. 6 is a front view of the vacuum chamber as shown in Fig. 5, PI 2610
    FIG. 7 is a perspective view of the rear portion of the vacuum chamber as shown in FIG. 5; FIG.
    8 is a perspective view of another embodiment of a device according to the invention for sample preparation in a high vacuum viewed from top left,
    9 is a perspective view of the device of FIG. 8 viewed from the top right,
    Fig. 10 is a side view of the device of Fig 8, and
    11 is a rear view of the device of FIG. 8th
    Fig. 1 shows a perspective view of a device 100 viewed from the top left, which is used for sample preparation in a fine vacuum, i. a vacuum to IO3 mbar, is provided. Fig. 2 shows a perspective view of the device 100 viewed from the top right. Within a housing 101, a vacuum chamber 105 made of metal and an electronic control unit, which is not visible in Fig. 1, are arranged. The control electronics are located in a foot region 102 below and in an area behind the vacuum chamber 105. The foot region 102 is therefore that region which is located below the lower edge of the vacuum chamber 105. In front of the foot region 102 of the housing 101 is an operating console 103 with touchscreen 104. The sample is located inside the vacuum chamber 105 on a sample table 120 (see FIGS. 5 and 6). The vacuum chamber 105 has on its front side a door 106 in which a viewing window 107 formed from a glass plate for visual monitoring of the taking place in the vacuum chamber 105 preparation process is embedded. A frame 108 surrounding the viewing window 107 guides the viewing window 107 to a seal 109 (see FIGS. 5 and 6). By closing the door 106 with a closure 112, the vacuum chamber 105 is sealed vacuum-tight. The housing 101 has a width b substantially equal to the width b 'of the vacuum chamber 105 accommodated therein. The term "essentially " means that the housing 101 is not more than the necessary mounting distance, which takes into account manufacturing tolerances, from the outer edge of the vacuum chamber 105. The outer width b 'of the vacuum chamber 105 is in this case the necessary wall thicknesses as well as the space for mounting holding and closing means (eg closure 112) for the door 106 and any sensors relative to the inner space 110 (see FIG 105 increases the -10- P12610 at least one source of a coating material, eg an evaporation source for e.g. a carbon filament or sputtering source with a sputtering target of e.g. Gold, platinum and the like is disposed at the top of the vacuum chamber 105. For changing and / or cleaning the sources, access to the vacuum chamber 105 is provided by means of a flap 111 of the housing 101, wherein the vacuum chamber 105 itself, as described in more detail below in FIGS. 5 and 6, has on its upper side a removable passage for receiving which has at least one source.
    3 shows a side view of the device 100. FIG. 4 also shows a rear view of the device 100 which shows the back region 113 of the housing 101. The back region 113 contains the necessary device connections, in particular a vacuum connection 114, a network connection 115 and a LAN Terminal 116 and the on / off switch 117 and a passage 118 for a supply hose for a process gas (eg, noble gas such as argon, oxygen and the like).
    5 shows a perspective view of the vacuum chamber 105 of the apparatus of FIG. 1 with the door 106 open, looking into the interior 110, wherein the housing 101, the control electronics and the operating console 103 have been removed for visualization of the vacuum chamber 105. The frame 108 surrounding the viewing window 10 leads the viewing window 107 to the seal 109. As already mentioned above, the control electronics are accommodated behind and below the metallic vacuum chamber 105, inter alia in the free foot region 102 formed by feet 118. Within the vacuum chamber 105 the sample table is height-adjustable and exchangeable or can be removed for easier fixing of the samples from the vacuum chamber 105. On the sample table 120 there are several sample receptacles 121 for receiving the samples The vacuum chamber has a width b ', wherein the housing 101 as already described above has a width b which essentially corresponds to the width b' of the vacuum chamber 105 To d the inner top surface of the vacuum chamber 105 is the at least one source of coating material, e.g. at least one evaporation source for e.g. a carbon thread and / or at least one sputter source with a sputtering target of e.g. Gold, platinum and the like, arranged The sources are each included in a passage which is connected to the vacuum chamber releasably vacuum -11- P12610 tightly connected. Correspondingly, the vacuum chamber 105 has on its upper side in its ceiling region 122 an opening 123 which can be closed in a vacuum-tight manner by means of the passage. Due to the removable feedthrough for the springs, they can easily be changed or removed for cleaning. For safety reasons, a protective cover 111 (FIGS. 1 to 3) is arranged above the bushing, which has a switching element which triggers when the protective cover 111 is opened and which is interrupted by a power source interruption, e.g. in the form of a safety switch. After opening the protective cover 111, the sources for changing and / or cleaning are easily and safely removed. Also visible in FIG. 5 is a vacuum connection pipe 124 for connecting the vacuum chamber 105 to a vacuum pump located outside the device 100 and the supply hose 125 for a process gas.
    Fig. 6 shows a front view of the vacuum chamber 105 as shown in Fig. 5, with a direct view into the interior 110 of the open vacuum chamber 105. Here is the receiving mechanism 130 for the sample table 120, which is connected to the underside of the chamber 119, shown , In the illustrated embodiment, the table is manually höhenver-adjustable and fix with a thumbscrew 131. Similarly, however, the height adjustment may also be motorized, e.g. via a spindle drive, whereby the motor and gear mechanism and the corresponding vacuum feedthroughs replace the simple receptacle 130. Shown further in Fig. 6 is a shutter 132 which may be flipped between source and sample to protect the sample from any contamination during cleaning and ignition of the source. The shutter 132 is motorized in the embodiment shown with an arm 133 pushed to the side and with a (not shown) spring on backward rotation of the arm 133 between the source and samples positioned on the top left in the chamber is a receptacle 134 for a layer thickness measuring head (not shown ), eg a quartz sensor, see. Individual edges of this receptacle 134 at the same time mark certain predetermined distances to the source, so that in a simple manner, the distance between the recorded on the sample table 120 samples and the coating source can be adjusted.
    Fig. 7 shows a perspective view of the rear portion of the vacuum chamber 105 as shown in Fig. 5, in which, as mentioned, the connections for vacuum, power and process gas are located. Also located here are the valves 135 for controlling the process gas and for venting the chamber 105. As described above, the shutter 132 is actuated by an arm 133 which is moved by the motor 136. Since all of these ports and controls extend rearwardly out of the back area, the width b 'of the vacuum chamber 105, and consequently the width b of the device 100, is kept very low.
    FIG. 8 shows a perspective view of another embodiment of a device 200 according to the invention viewed from the top left for sample preparation in a high vacuum, i. a vacuum of better than IO3 mbar up to IO-7 mbar, possibly 10-mbar. 9 shows a perspective view of the device 200, viewed from the top right. In analogy to the apparatus shown in FIGS. 1 to 7 for sample preparation in the field vacuum, in the device 200 within a housing 201, a vacuum chamber 205 made of metal and a non-visible control electronics are arranged. The control electronics as well as the necessary pumps, e.g. a turbomolecular pump and an upstream diaphragm pump, are located below and behind the vacuum chamber 205, preferably in a foot portion 202 of the housing 201. In front of the foot portion 202 of the housing is a control panel 203 with touch screen 204. The sample is within the vacuum chamber 205 and is , in analogy to the device 100, arranged on a sample table. The vacuum chamber 205 has on its front side a door 206 in which a viewing window 207 formed from a glass plate for visual monitoring of the preparation process taking place in the vacuum chamber 205 is embedded. A frame 208 surrounding the viewing window 207 leads the viewing window 207 to a seal. By closing the door with a closure 212, the vacuum chamber 205 is sealed vacuum-tight. By analogy with the device 100, the housing 201 of the device 200 also has a width b " which substantially corresponds to the width of the vacuum chamber 205 accommodated therein. The at least one source of coating material, e.g. an evaporation source for e.g. a carbon thread and / or a sputter source with a sputtering target of e.g. Gold, platinum and the like are disposed at the top of the vacuum chamber 205. For changing and / or cleaning the sources, an access to the vacuum chamber 205 is provided by means of a flap 211 of the housing 201, the vacuum chamber 205 itself, in analogy to the vacuum chamber 105 described above, having a removable passage below the flap 211 for each source arranged , The flap 211 also fulfills the function of a protective cover in analogy to the flap 111. Furthermore, flanges are arranged laterally on the vacuum chamber 205, which are closed in the figures -13- PI 2610 by blind flanges 215 (Fig. 8) and 216 (Fig. 9). Extensions carried out by the housing 201, in particular a transfer device, a lock or a cooling device with a reservoir for a cryogen, can be connected to these flanges. Due to the small width and the associated narrow design of the device 200, it is therefore possible to connect extensions on the left or right side flanges, without thereby excessively large laboratory floor space is claimed. For example, cryofixed samples, which are cooled very rapidly to avoid ice crystal formation, must be transferred to the apparatus of the invention in the cooled state for further sample preparation (e.g., freeze fracture, freeze etch, freeze drying, etc.). This transfer of the cryofixed sample is very critical because the sample immediately coats with ice crystals on contact with moist air. The transfer therefore takes place by means of a special (vacuum) transfer device, for example with a Leica EM VCT100 vacuum cryotransfusion device. Accordingly, the necessary processing tools and devices for cryopreparation (e.g., freeze fracture, freeze etch) are provided in vacuum chamber 205 for these purposes. Non-cooled sample holders with samples taken therein can also be introduced into the vacuum chamber of the device via a lock. Further, a cooling device such as a Dewarge vessel filled with liquid nitrogen may be connected to cool the samples in the vacuum chamber via cooling belts and / or to control the vacuum caused by the cold surfaces of the vessel which act similar to a cryopump improve.
    FIG. 10 shows a side view of the device 200. FIG. 11 also shows a rear view of the device 200, which shows the back region 213 of the housing 201 or of the device 200. The necessary device connections such as process gas, mains and LAN connections are located exclusively in the back area 213, whereby the width b " the device 200 is kept very low.
    权利要求:
    Claims (12)
    [1]
    Claims 1. A device (100, 200) for coating preparations comprising: - a vacuum chamber (105, 205) in the form of a metallic recipient, - at least one source of coating material assigned to the vacuum chamber (105, 205), - at least one sample holder ( 120), by means of which at least one sample to be prepared can be positioned within the vacuum chamber (105, 205) in a sample position, - a control electronics, - a control panel (103, 203) for inputting commands for the control electronics, and - a housing (101, 201 ), which surrounds at least the vacuum chamber (105, 205) and the control electronics, characterized in that the housing (101, 201) has a width (b, b ") equal to the width (b ') of the vacuum chamber (105, 205) in FIG Substantially, wherein the vacuum chamber (105, 205) has a door (106, 206) located at a front of the chamber, the control panel (103, 203) in or in front of below Vacuum chamber (105, 205) disposed foot portion (102,202) of the housing (101,201) is located, and the at least one source on the upper side of the vacuum chamber (105,205) is mountable
    [2]
    2. Device according to claim 1, characterized in that the front of the vacuum chamber (105,205) is a flat surface with an opening formed therein and the door (106,206) is formed by a at the edge of the opening on the outside held plate with which the opening vacuum-tight is closable.
    [3]
    3. Apparatus according to claim 2, characterized in that the vacuum chamber (105, 205) has a cuboid basic shape, wherein one side of the cuboid forms the front. -15- PI 2610
    [4]
    4. Device according to one of claims 1 to 3, characterized in that the device for the preparation of samples for a subsequent examination in an electron microscope is designed and on the sample holder (120) at least one sample in a reversibly attachable to the sample holder sample receptacle receivable is.
    [5]
    5. Device according to one of claims 1 to 4, characterized in that each of the at least one source is received in a removable passage and fastened with this at the top of the vacuum chamber (105,205).
    [6]
    6. Apparatus according to claim 5, characterized in that on the at least one source, a protective cover (111, 211) is arranged, which has a switching element which triggers when opening the protective cover (111, 211) and with an interruption for the power supply of at least one source is connected.
    [7]
    7. Device according to one of the preceding claims, characterized in that the housing (101, 201) of the vacuum chamber (105, 205) bears laterally at its maximum lateral extent
    [8]
    8. Device according to one of the preceding claims, characterized in that the control electronics below and / or behind the vacuum chamber (105, 205) is arranged.
    [9]
    9. Device according to one of the preceding claims, characterized by laterally on the vacuum chamber (205) located flanges, which are performed by the housing extensions, in particular a TransfeTeinrichtung, a lock or a cooling device with a memory for a cryogen, can be connected.
    [10]
    10. Device according to one of the preceding claims, characterized in that the vacuum chamber (105,205) terminals (114,124) for vacuum supply which terminals exclusively on the back (113) of the vacuum chamber (105, 205) are arranged. -16- PI 2610
    [11]
    11, Device according to one of the preceding claims, characterized in that within the vacuum chamber (105, 205) a device for carrying out a cryo-sample preparation is arranged
    [12]
    12. Device according to one of the preceding claims, characterized in that in the vacuum chamber (105, 205) a quartz crystal for measuring the deposited coating material layer thickness is arranged.
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    同族专利:
    公开号 | 公开日
    KR20130136384A|2013-12-12|
    US20130319328A1|2013-12-05|
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    JP2013250265A|2013-12-12|
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US4311725A|1978-08-18|1982-01-19|National Research Development Corporation|Control of deposition of thin films|
    EP1531189A1|2003-11-12|2005-05-18|Specialty Coating Systems, Inc.|A vapor deposition apparatus|
    JP2009132966A|2007-11-30|2009-06-18|Shincron:Kk|Film deposition system|
    US4888202A|1986-07-31|1989-12-19|Nippon Telegraph And Telephone Corporation|Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film|
    US5078851A|1989-07-26|1992-01-07|Kouji Nishihata|Low-temperature plasma processor|
    JPH03208245A|1990-01-08|1991-09-11|Fuji Electric Co Ltd|Low temperature scanning type microscope|
    US5082547A|1991-02-01|1992-01-21|Plasma Etch|Plasma etching reactor|
    US6258170B1|1997-09-11|2001-07-10|Applied Materials, Inc.|Vaporization and deposition apparatus|
    US6296711B1|1998-04-14|2001-10-02|Cvd Systems, Inc.|Film processing system|
    JP2001192812A|1999-12-28|2001-07-17|Shin Meiwa Ind Co Ltd|Vacuum film deposition system|
    JP2003038949A|2001-07-30|2003-02-12|Ulvac Japan Ltd|Device for processing under vacuum|
    US20030033857A1|2001-08-16|2003-02-20|Franks Stephen H.|Apparatus and method to detect leaks in sealed packages|
    WO2003038145A2|2001-10-29|2003-05-08|Genus, Inc.|Chemical vapor deposition system|
    US7193510B2|2005-05-02|2007-03-20|Honeywell International Inc.|Safety interlock circuit with diagnostics requiring no extra signal wires|
    JP5498824B2|2010-03-16|2014-05-21|株式会社Ｓｎｔ|Method and apparatus for producing alternating adsorption film by spray method|DE102014118801B4|2014-12-17|2016-10-06|Leica Mikrosysteme Gmbh|Freeze-fracture machine|
    EP3091101B1|2015-05-06|2018-10-17|safematic GmbH|Coating unit|
    EP3091561B1|2015-05-06|2019-09-04|safematic GmbH|Sputter unit|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    ATA50220/2012A|AT512950B1|2012-06-04|2012-06-04|Device for preparing, in particular coating, samples|ATA50220/2012A| AT512950B1|2012-06-04|2012-06-04|Device for preparing, in particular coating, samples|
    KR1020130058851A| KR20130136384A|2012-06-04|2013-05-24|Apparatus for preparing, in particular coating, samples|
    JP2013111345A| JP6231777B2|2012-06-04|2013-05-27|Equipment for sample preparation, especially coating|
    US13/906,444| US20130319328A1|2012-06-04|2013-05-31|Apparatus for preparing, in particular coating, samples|
    DE102013009202.7A| DE102013009202B4|2012-06-04|2013-06-03|Device for preparing, in particular coating, samples|
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